EE 143 Microfabrication Technology Lecture 9c Lithography III Oxidation Lecture 9 Lithography III Oxidation Announcements Friday afternoon the only other possible office hour time labs and lecture throughout the other times Best to keep the Thursday 9 10 30 a m office hours Lecture Topics Four main components of lithography Radiation source Mask Photoresist Exposure system Resolution Linewidth control Alignment accuracy Oxidation Oxidation Theory Oxidation Graphs Dopant Redistribution During Oxidation Last Time Finished Lecture Module 1 CTN 2 16 10 Collimating Lens Aperture Point Source d f Collected Light Diffracted Light 1 22 f d Copyright 2010 Regents of the University of California Image Plane Focusing Lens EE 143 Microfabrication Technology Lecture 9c Lithography III Oxidation Entrance Aperture CTN 2 16 10 Image Plane Point Sources B A d A B Copyright 2010 Regents of the University of California EE 143 Microfabrication Technology Lecture 9c Lithography III Oxidation Copyright 2010 Regents of the University of California CTN 2 16 10 EE 143 Microfabrication Technology Lecture 9c Lithography III Oxidation Copyright 2010 Regents of the University of California CTN 2 16 10 EE 143 Microfabrication Technology Lecture 9c Lithography III Oxidation Copyright 2010 Regents of the University of California CTN 2 16 10 EE 143 Microfabrication Technology Lecture 9c Lithography III Oxidation Copyright 2010 Regents of the University of California CTN 2 16 10
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