“Polymer Pen” NanolithographySlide 2Slide 3Slide 4Slide 5Slide 6Slide 7“Polymer Pen” NanolithographyJ. WuPhys. Dept.references: Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, and Chad A. Mirkin Science, 321, 1658 (2008). NSE 203PenPenInkInkSubstrateSubstrateAn old wisdom: Dip-Pen technologyAn old wisdom: Dip-Pen technologyMore than 4000 years ago…On Jan, 1999PatternsPatternsDip-pen lithography is straightforward. Any draw back?Lithography:Parallel replicationSerial replicationPhotolithographyContact printingNanoimprint lithographyE-beam lithographyIon-beam lithographyAdvantage: Time effective, economicDip-pen lithography?The secret: multi-identical-pensThe secret: multi-identical-pens~11,000,000 pensSecond Advantage: size controllableSecond Advantage: size controllablePattern size controlled by the pressure on polymer.Chinese calligraphyMassive production of patterns2008 Beijing Olympic logoThe total time required is less than 40
View Full Document