Slide 1Slide 2Slide 3Slide 4Slide 5Slide 6Slide 7Slide 8Slide 9Top-down techniqueToshitake Takahashi03/09/2009EE235• Demonstrate a new method to fabricate single fluidic-channel of uniform channel width (11-50nm) and over 1.5cm in length • Imprint mold is created by unconventional nanofabrication (crystallographic anisotropic etching…)Overview(a) Innovative mold fabrication that creates a nanoimprint mold (b) Use of the mold to imprint the nanochannel line in a functionalmaterial layer(c) Optical RIE that transferres the imprinted patterns into a substrateSchematic of fabrication steps for making imprint moldAnisotropic wet etching with KOHAtomically smooth sidewall• Conformal deposition of SiNxensure uniform channel width• Channel width is defined by SiNx film thicknessSEM images of each stepTop-down SEM images of 17nm, 1.5cm long channel• Uniform over the entirechannel• Offer sub-10nm lithographicresolution for patterningsub-20nm channel lineChannel continuity tests(1) DI water containing fluorescent dye(2) DNA labeled with TOTO-1 fluorescent dye(1) Flowing colored water (2) Flowing DNA in solutionElectrical conductance measurement• With a salt solution, electrical conductance : Gm=66.1 nS• Electrical conductivity is σ=GmL/wd=10.2 S/mMicrochannel Nanochannel• Electrical conductance : Gm=0.40 pS• channel cross-section: 314 nm2 =(17.7 nm×17.7 nm)Conclusion• Demonstrate the fabrication of a single, narrow(as small as 11nm), long (over 1.5cm) and continuousfluidic channel • This technique can be used for a variety of innovativebio/chemical sensors, particullary single-stranded DNAsequencing
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