Plasma Enhanced Chemical Vapor Deposition (PECVD)Pathros Cardenas & David TungWhat is Chemical Vapor Deposition?What is Plasma Enhanced Chemical Vapor Deposition? CVD process that uses plasma Uses cold plasma Keeps wafers at low temperatures Enhances properties of layers being depositedWhat is a Plasma? Ionized gas High free electron content Unique state of matter Electric fields energize plasma Cold plasma (not in thermal equilibrium)Where can we find Plasma?The Reaction Gas is introduced Ionized by plasma Diffusions of particles through sheath Electron bombardment onto substrate Absorption of particles Layer formationPECVD Reactors Parallel plate reactor Inductive coupling reactor Advanced parallel plate reactor Tubular reactorParallel plate reactorAdvanced parallel plate reactor Double sided vertical holder reactorTubular reactorAdvantages of using PECVD Low operation temperature Lower chances of cracking deposited layer Good dielectric properties of deposited layer Good step coverage Less temperature dependentDisadvantages of using PECVD Toxic byproducts High cost of equipmentApplications Deposition of silicate layers Deposition of dopants Anti-reflection and anti-scratch layers in optics Solar cells -> amorphous siliconConclusion PECVD is not a replacement for CVD PECVD can give better layer quality than CVD PECVD has a wide variety applications PECVD process costs can be prohibitiveReferences 1. "Chemical Vapor Deposition." Wikipedia. 27 Sept. 2007. 11 Oct. 2007 <http://en.wikipedia.org/wiki/Chemical_vapor_deposition>. 2. Jaeger, Richard C. Introduction to Microelectronic Fabrication. 2nd ed. Vol. 5. Upper Saddle River, NJ: Prentice Hall, 2002. 136-141. 3. Konuma, Mitsuharu. Film Deposition by Plasma Techniques. Berlin: Spring-Verlag, 1992. 4. Konuma, Mitsuharu. Plasma Techniques for Film Deposition. Harrow, U.K.: Alpha Science International Ltd., 2005. 5. "PECVD Process." MicroFAB BREMEN GMBH. 17 May 2004. 14 Oct. 2007 <http://www.microfab.de/services/pecvd.htm>. 6. "Plasma (Physics)." Wikipedia. 15 Oct. 2007. 12 Oct. 2007 <http://en.wikipedia.org/wiki/Plasma_%28physics%29>. 7. "Plasma-Enhanced Chemical Vapor Deposition." Wikipedia. 30 Aug. 2007. 11 Oct. 2007 <http://en.wikipedia.org/wiki/Plasma_Enhanced_Chemical_Vapor_Deposition>. 8. "Plasma Enhanced CVD." Hitech-Projects. 2007. 14 Oct. 2007 <http://www.hitech-projects.com/dts/docs/pecvd.htm>. 9. Sherman, Arthur. Chemical Vapor Deposition for Microelectronics Principles, Technology, and Applications. Park Ridge, NJ: Noyes Publications,
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