Plasma Enhanced Chemical Vapor Deposition PECVD Pathros Cardenas David Tung What is Chemical Vapor Deposition What is Plasma Enhanced Chemical Vapor Deposition CVD process that uses plasma Uses cold plasma Keeps wafers at low temperatures Enhances properties of layers being deposited What is a Plasma Ionized gas High free electron content Unique state of matter Electric fields energize plasma Cold plasma not in thermal equilibrium Where can we find Plasma The Reaction Gas is introduced Ionized by plasma Diffusions of particles through sheath Electron bombardment onto substrate Absorption of particles Layer formation PECVD Reactors Parallel plate reactor Inductive coupling reactor Advanced parallel plate reactor Tubular reactor Parallel plate reactor Advanced parallel plate reactor Double sided vertical holder reactor Tubular reactor Advantages of using PECVD Low operation temperature Lower chances of cracking deposited layer Good dielectric properties of deposited layer Good step coverage Less temperature dependent Disadvantages of using PECVD Toxic byproducts High cost of equipment Applications Deposition of silicate layers Deposition of dopants Anti reflection and anti scratch layers in optics Solar cells amorphous silicon Conclusion PECVD is not a replacement for CVD PECVD can give better layer quality than CVD PECVD has a wide variety applications PECVD process costs can be prohibitive References 1 Chemical Vapor Deposition Wikipedia 27 Sept 2007 11 Oct 2007 http en wikipedia org wiki Chemical vapor deposition 2 Jaeger Richard C Introduction to Microelectronic Fabrication 2nd ed Vol 5 Upper Saddle River NJ Prentice Hall 2002 136 141 3 Konuma Mitsuharu Film Deposition by Plasma Techniques Berlin Spring Verlag 1992 4 Konuma Mitsuharu Plasma Techniques for Film Deposition Harrow U K Alpha Science International Ltd 2005 5 PECVD Process MicroFAB BREMEN GMBH 17 May 2004 14 Oct 2007 http www microfab de services pecvd htm 6 Plasma Physics Wikipedia 15 Oct 2007 12 Oct 2007 http en wikipedia org wiki Plasma 28physics 29 7 Plasma Enhanced Chemical Vapor Deposition Wikipedia 30 Aug 2007 11 Oct 2007 http en wikipedia org wiki Plasma Enhanced Chemical Vapor Deposition 8 Plasma Enhanced CVD Hitech Projects 2007 14 Oct 2007 http www hitechprojects com dts docs pecvd htm 9 Sherman Arthur Chemical Vapor Deposition for Microelectronics Principles Technology and Applications Park Ridge NJ Noyes Publications 1987 QUESTIONS
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