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E beam Lithography vs X ray Lithography Erik Crowe Viet Nguyen E Beam Lithography 3 Important Parts of EBL Machine Electron gun Vacuum System Control System E Beam Lithography Advantages The resolution is not limited by diffraction minimum feature is written on the nanoscale Can write smaller features than X ray Lithography Photolithography Pattern is written directly to the wafer Used to develop Specialized devices Prototype devices E Beam Lithography Disadvantages Not an efficient process for industrial processing Takes multiple hours to pattern an entire wafer Machines are Costly Greater than 4 million dollars System is more complex than Photolithography System Scattering and Overexposure Results in minimum feature being larger E Beam Applications Research Development Advanced processing techniques Future processing equipment Can convert SEM to be used as an EBL Machine Minimum resolution is slightly larger Used with Photolithography and X ray Lithography to create next generation devices X Ray Lithography Concept Process similar to photolithography X ray radiation Gap between mask and silicon wafer X ray resists X ray masks are thinner X Ray Lithography X Ray Lithography Pros resolves diffraction shorter wavelengths 1 10 nm smaller features X Ray Lithography Disadvantages thin X ray masks deformations vibrations time consuming X Ray Lithography Applications nanolithography create transistors with smaller features Moore s Law References B Braun Producing Integrated Circuits With X ray Lithography UER Main Online Available http elvis engr wisc edu uer uer97 author7 index html Accessed 9 20 2009 F Hochgrat Scanning Electron Microscopes October 1 1998 Outline Available http nhml com resources 1998 10 1 scanning electronmicroscopes sem Accessed 9 20 2009 H J Levinson Proximity X ray Lithography SPIE Press Bellingham WA 2005 Online Available http spie org x33182 xml Accessed 9 20 2009 M Madou Fundamentals of microfabrication CRC Press 2002 723 R Levy Microelectronic materials and processes illustrated Springer 1989 985 Z L Wang Handbook of Nanophase and Nanostructured Materials Springer 2002 1200


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UMD ENEE 416 - E-beam Lithography vs. X-ray Lithography

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