E-beam Lithography vs.X-ray LithographyErik CroweViet NguyenE-Beam Lithography 3 ImportantParts of EBLMachine Electron gun Vacuum System Control SystemE-Beam Lithography Advantages The resolution is not limited by diffraction,minimum feature is written on thenanoscale Can write smaller features than: X-ray Lithography Photolithography Pattern is written directly to the wafer Used to develop Specialized devices Prototype devicesE-Beam Lithography Disadvantages Not an efficient process for industrialprocessing Takes multiple hours to pattern an entirewafer Machines are Costly Greater than 4 million dollars System is more complex than Photolithography System Scattering and Overexposure Results in minimum feature being largerE-Beam Applications Research Development Advanced processing techniques Future processing equipment Can convert SEM to be used as an EBLMachine Minimum resolution is slightly larger Used with Photolithography and X-rayLithography to create next generationdevicesX-Ray Lithography Concept - Process similar to photolithography - X-ray radiation - Gap between mask and silicon wafer - X-ray resists - X-ray masks are thinnerX-Ray LithographyX-Ray Lithography Pros - resolves diffraction - shorter wavelengths (.1-10 nm) - smaller featuresX-Ray Lithography Disadvantages - thin X-ray masks - deformations - vibrations - time consumingX-Ray Lithography Applications - nanolithography - create transistors with smallerfeatures - Moore’s LawReferences B. Braun, “Producing Integrated Circuits With X-ray Lithography,”UER Main, [Online]. Available:http://elvis.engr.wisc.edu/uer/uer97/author7/index.html.[Accessed: 9-20-2009]. F. Hochgrat, “Scanning Electron Microscopes.” October 1, 1998.[Outline]. Available:http://nhml.com/resources/1998/10/1/scanning-electron-microscopes-sem. [Accessed: 9-20-2009]. H. J. Levinson, “Proximity X-ray Lithography,” SPIE Press,Bellingham, WA, 2005. [Online]. Available:http://spie.org/x33182.xml. [Accessed: 9-20-2009]. M. Madou, Fundamentals of microfabrication, CRC Press, 2002,723. R. Levy, Microelectronic materials and processes, illustrated.Springer, 1989, 985. Z.L. Wang, Handbook of Nanophase and Nanostructured Materials.Springer, 2002,
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