DOC PREVIEW
UMD ENEE 416 - Electron Beam and X-Ray Lithography

This preview shows page 1-2-3-4-5 out of 16 pages.

Save
View full document
View full document
Premium Document
Do you want full access? Go Premium and unlock all 16 pages.
Access to all documents
Download any document
Ad free experience
View full document
Premium Document
Do you want full access? Go Premium and unlock all 16 pages.
Access to all documents
Download any document
Ad free experience
View full document
Premium Document
Do you want full access? Go Premium and unlock all 16 pages.
Access to all documents
Download any document
Ad free experience
View full document
Premium Document
Do you want full access? Go Premium and unlock all 16 pages.
Access to all documents
Download any document
Ad free experience
View full document
Premium Document
Do you want full access? Go Premium and unlock all 16 pages.
Access to all documents
Download any document
Ad free experience
Premium Document
Do you want full access? Go Premium and unlock all 16 pages.
Access to all documents
Download any document
Ad free experience

Unformatted text preview:

Ankit Chaudhari Musa Ibrahim Electron Beam and X-Ray LithographyElectron Beam Lithography: Application  Electron beam Lithography (EBL) is used primarily for two purposes very high resolution lithography. fabrication of masks ( by etching process)  It uses Serial Lithographic systemElectron Beam Sources  Thermionic Emitters Electrons released due to thermal energy  Photo Emitters due to incident radiations ( photons)  Field Emitters due to applied current and quantum mechanical property of electrons.Procedures of EBL  Sample is coated with a thin layer of resist Polymethylmethacrylate (PMMA)  PMMA breaks down into monomers upon exposure to electrons.  The exposed regions can be rinsed away (developed) using a chemical Methyl-isobutyl-ketone (MIBK)Advantages of EBL  Print complex patterns directly on wafers Eliminates the diffraction problem High resolution up to 20 nm(photolithography ~50nm)  Flexible techniqueDisadvantages of EBL Slower than optical lithography.  Expensive and complicated Forward scattering Backscattering Secondary electronsMachine structureEBL Components  Deflection coils and lenses: to focus the electron  Beam blanking: turning the beam on and off  Stigmators: is a special type of lens used to compensate for imperfections in the construction and alignment of the EBL Colum.  Vacuum: to isolate the electron beam from interferencesX-Ray Lithography: Application  X-ray lithography is primarily used in nanolithography 15 nm optical resolution Utilizes short wavelength of 1 nm Simple: Requires no lenses Allows for small feature sizeProcedures of X-Ray Lithography  PMMA is applied to the surface of silicon wafer  PMMA hardens when contacted with x-rays  X-ray mask is applied on top of silicon wafer before exposure Absorber Membrane  Synchrotron radiation (0.2 – 2 nm)  Gap between substrate and maskAdvantages of X-Ray Lithography Short wavelength from X-rays 0.4-4 nm No diffraction effect Simple to use No lens Faster than EBL Uniform refraction pattern High resolution for small feature sizeDisadvantages of X-ray Lithography Thin lens Distortion in absorber Cannot be focused through lens  Masks are expensive to produceX-Ray Lithography Machine StructureComponents  Absorber – reduce scattering of X-rays  Membrane – allows X-rays to travel through  Vacuum- to isolate the X-ray from interferencesQUESTIONS?Works Cited  B. Braun, “Producing Integrated Circuits With X-ray Lithography” February 4, 2004, [Online]. Available: http://tc.engr.wisc.edu/uer/uer97/author7/index.html. [Accessed: 9/18/2011]  B. Hans-Georg, “Electron Beam Lithography” September 22, 2008, UER Main,[Online]. Available: http://www.ipfdd.de/uploads/media/Lithohbmain_02.pdf .[Accessed: 9/18/2011]   C. Friedrich, “X-Ray Lithography” March 1, 2000, [Online]. Available: http://www.me.mtu.edu/~microweb/chap1/ch1-4-2.htm.[Accessed: 9/19/2011]  Y. Jiang, “Electron Beam and Conventional Lithography” UER Main,[Online]. Available: http://www.dssc.ece.cmu.edu/news/seminars/lunch05/headsmedia/041205.pdf.


View Full Document

UMD ENEE 416 - Electron Beam and X-Ray Lithography

Download Electron Beam and X-Ray Lithography
Our administrator received your request to download this document. We will send you the file to your email shortly.
Loading Unlocking...
Login

Join to view Electron Beam and X-Ray Lithography and access 3M+ class-specific study document.

or
We will never post anything without your permission.
Don't have an account?
Sign Up

Join to view Electron Beam and X-Ray Lithography 2 2 and access 3M+ class-specific study document.

or

By creating an account you agree to our Privacy Policy and Terms Of Use

Already a member?