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UDC EE 474 - Lab Report Instruction
School name University of the District of Columbia
Course Ee 474-
Pages 1

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Lab Report Instruction Title Fabrication of a MOS Capacitor Device Our Substrate is SiO2 on Silicon Wafer where SiO2 is 300nm Paragraphs First Paragraph Photolithography Processes of MOS Capacitor Devices Second Paragraph Analysis of Photolithography Processes including 1 What does each step 2 Why we do each step 3 Answer each question in 10 questions Third Paragraph Conclusion

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UDC EE 474 - Lab Report Instruction

School: University of the District of Columbia
Course: Ee 474-
Pages: 1
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