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Berkeley ELENG C245 - Introduction to MEMS Design and Fabrication

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Introduction to MEMS Design and FabricationA brief history of MEMSReferencesSlide 4Slide 5Slide 6Early Semiconductor FabricationIntel 133 MHz Pentium Processor 3.3 million transistors 0.35 micron lithography 4 layer metalization First silicon: May 1995FabricationProcess FlowMaterialsApplicationsCourse contentSUGAR: Spice-like environmentksjp, 7/01MEMS Design & FabIntroduction to MEMS Design and FabricationKristofer S.J. PisterBerkeley Sensor and Actuator CenterUC Berkeleyksjp, 7/01MEMS Design & FabA brief history of MEMS•1750s first electrostatic motors (Benjamin Franklin, Andrew Gordon)•1824 Silicon discovered (Berzelius)•1927 Field effect transistor patented (Lilienfield) •1947 invention of the transistor (made from germanium)•1954 Smith, C.S., "Piezoresistive effect in Germanium and Silicon, Physical Review, 94.1, April 1954.•1958 silicon strain gauges commercially available•1961 first silicon pressure sensor demonstrated (Kulite)•1967 Invention of surface micromachining (Nathanson, Resonant Gate Transistor)•1970 first silicon accelerometer demonstrated (Kulite)•1977 first capacitive pressure sensor (Stanford)•1980 Petersen, K.E., "Silicon Torsional Scanning Mirror", IBM J. R&D, v24, p631, 1980.•1982 disposable blood pressure transducer (Foxboro/ICT, Honeywell, $40)•1982 active on-chip signal conditioning•1984? First polysilicon MEMS device (Howe, Muller )•1988 Rotary electrostatic side drive motors (Fan, Tai, Muller)•1989 Lateral comb drive (Tang, Nguyen, Howe)•1991 polysilicon hinge (Pister, Judy, Burgett, Fearing)•1992 Grating light modulator (Solgaard, Sandejas, Bloom)•1992 MCNC starts MUMPS•1993? first surface micromachined accelerometer sold (Analog Devices, ADXL50)•1994 XeF2 used for MEMS (OK, so this one isn’t as important as the others)ksjp, 7/01MEMS Design & FabReferences•Books•Elwenspoek and Jansen, Silicon Micromachining, Cambridge•Keller, Microfabricated High Aspect Ratio Silicon Flexures, MEMS Precision Instruments •Kovacs, Micromachined Transducers Sourcebook, McGraw-Hill•Madou, Fundamentals of Microfabrication, CRC•Maluf, An Introduction to Microelectromechanical Systems Engineering, Artech House•Ristic, Sensor Technology and Devices, Artec House•Senturia, Microsystem Design, Kluwer•Sze, Semiconductor Sensors, Wileyksjp, 7/01MEMS Design & FabReferences•Conferences•Sensors and Actuators Workshop (Hilton Head), even years, Hilton Head Island, SC. N. America only•IEEE MEMS workshop, annual, 00 Japan, 01 Europe, 02 U.S.•Intl. Conf. Solid State Sensors and Actuators (Transducers), odd years, 99 Japan, 01 Europe, 03 U.S.•MOEMS, 97 Japan, 98 U.S. (LEOS), 99 Germany •SPIE, annual, San Jose, CA. (formerly Austin, TX)•LEOS, OSA, CLEO•ASME•…ksjp, 7/01MEMS Design & FabReferences•Periodicals•IEEE/ASME, JMEMS•Sensors and Actuators A/B•J. Micromechanics and Microengineering•Sensors and Materials•Articles•Petersen, Silicon as a Mechanical Material, Proc. IEEE, V70 pp.420-457, 1982.•Proc. IEEE V86N8, 1998 Special issue on MEMS•Wu, Micromachining for Optical and Optoelectronic Systems, Proc. IEEE V85N11 pp.1833-1856, 1997.ksjp, 7/01MEMS Design & FabReferencesHttp://www.memsnet.org - probably the best overall MEMS site on theweb. Materials database, bibliography are great.ksjp, 7/01MEMS Design & FabEarly Semiconductor FabricationJ. Bardeen, W.H. Brattain, “The first transistor, a semiconductor triode”, Phys. Rev., 74, 230 (1948).ksjp, 7/01MEMS Design & FabIntel 133 MHzPentium Processor 3.3 million transistors0.35 micron lithography4 layer metalizationFirst silicon: May 1995ksjp, 7/01MEMS Design & FabFabrication•IC Fabrication•Deposition•Lithography•Removal•Bulk micromachining•Crystal planes•Anisotropic etching•Deep Reactive Ion Etching•Surface micromachining•Sacrificial etching•Molding•Bondingksjp, 7/01MEMS Design & FabProcess Flow•Integrated Circuits and MEMS identical•Process comlexity/yield related to # trips through central loopDeposition Lithography EtchWafersChipsksjp, 7/01MEMS Design & FabMaterials•Metals•Al, Au, Cu, W, Ni, TiNi, NiFe, •Insulators•SiO2 - thermally grown or vapor deposited (CVD)•Si3N4 - CVD•Polymers •The King of Semiconductors: Silicon•stronger than steel, lighter than aluminum•single crystal or polycrystalline•10nm to 10mmksjp, 7/01MEMS Design & FabApplications•Pressure sensors•Automotive, Medical, Industrial, …•Accelerometers•Automotive, Medical, Industrial•Gyros•Automotive•Displays•TI DMD, SLM GLV•Fiber optics•Switches, attenuators, alignment•RF components•Relays, filters, tunable passive elements•Biomedicine•Drug delivery, DNA sequencing, chemical analysisksjp, 7/01MEMS Design & FabCourse content•Fabrication•Materials, geometry•Compatibility, integration•Physics•Beam theory, electrostatics, thermal, fluidic, …•Design•Combs, springs, hinges•Resonators, accelerometers, gyros•Scanning mirrorsksjp, 7/01MEMS Design & FabSUGAR: Spice-like environmentSimulation EngineAnalyses:


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Berkeley ELENG C245 - Introduction to MEMS Design and Fabrication

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