Wavefront detection modulation Detection Types of photodetectors Digital imaging Color Modulation Photographic film Spatial light modulators Binary optics MIT 2 71 2 710 Optics 11 30 05 wk13 b 1 Imaging detection of light a photothermal pyroelectric b photoconductivity c photoresistivity bolometers d photomechanical MIT 2 71 2 710 Optics 11 30 05 wk13 b 2 B J hne H Hau ecker Computer Vision and Applications Academic Press 2000 Digital imaging Charge Coupled Devices CCDs MIT 2 71 2 710 Optics 11 30 05 wk13 b 3 B J hne H Hau ecker Computer Vision and Applications Academic Press 2000 Digital imaging CMOS microlens arrays improve sensitivity APS active pixel sensor MIT 2 71 2 710 Optics 11 30 05 wk13 b 4 B J hne H Hau ecker Computer Vision and Applications Academic Press 2000 Color MIT 2 71 2 710 Optics 11 30 05 wk13 b 5 B J hne H Hau ecker Computer Vision and Applications Academic Press 2000 Color MIT 2 71 2 710 Optics 11 30 05 wk13 b 6 http www dpreview com news 0202 02021102foveonx3tech asp Improved color the Foveon MIT 2 71 2 710 Optics 11 30 05 wk13 b 7 http www dpreview com news 0202 02021101foveonx3 asp Improved color the Foveon US Patent 5 965 875 MIT 2 71 2 710 Optics 11 30 05 wk13 b 8 http www dpreview com news 0202 02021102foveonx3tech asp Improved color the Foveon MIT 2 71 2 710 Optics 11 30 05 wk13 b 9 http www dpreview com news 0202 02021102foveonx3tech asp Light modulation MIT 2 71 2 710 Optics 11 30 05 wk13 b 10 Photographic films plates protective layer emulsion with silver halide e g AgBr grains base glass mylar acetate Exposure Ag e Ag or 2Ag 2e Ag2 Collection of development specks latent image development speck Development 1st chemical bath converts specks to metallic silver Fixing the emulsion 2nd chemical bath removal of unexposed silver halide MIT 2 71 2 710 Optics 11 30 05 wk13 b 11 Photographic film plates Exposure energy energy incident per unit area on a photographic emulsion during the exposure process units mJ cm2 Exposure incident intensity exposure time E Iexpose T Intensity transmittance average ratio of intensity transmitted over intensity incident after development x y local I transmitted at x y average I incident at x y Photographic density 1 D log10 10 D MIT 2 71 2 710 Optics 11 30 05 wk13 b 12 Photographic film plates Hurter Driffield curve high low high low contrast film Saturation region Shoulder D 2 Toe Linear region slope log E Gross fog MIT 2 71 2 710 Optics 11 30 05 wk13 b 13 Gamma curve 1 5 10 15 min development time Kelley model of photographic process Optical imaging during exposure H D curve linear nonlinear D measured density MIT 2 71 2 710 Optics 11 30 05 wk13 b 14 additional blur due to chemical diffusion linear H D curve log E inferred logarithmic exposure The Modulation Transfer Function Exposure M adjacency effect due to chemical diffusion 1 0 Effective exposure 0 5 u0 MIT 2 71 2 710 Optics 11 30 05 wk13 b 15 E E0 E1 cos 2 u0 x E E0 M u0 E1 cos 2 u0 x Bleaching phase modulation exposure emulsion x y z tanning bleach relief grating MIT 2 71 2 710 Optics 11 30 05 wk13 b 16 non tanning bleach index grating Spatial Light Modulators Liquid crystals Magneto Optic Micro mirror Grating Light Valve Multiple Quantum Well Acousto Optic MIT 2 71 2 710 Optics 11 30 05 wk13 b 17 Liquid crystal modulators Nematic Smectic smectic C phase ferroelectric Cholesteric OFF crossed polarizers MIT 2 71 2 710 Optics 11 30 05 wk13 b 18 V acts as 2 plate rotates polarization by 90 crossed polarizers Micro mirror technology Lucent Bell Labs Texas Instruments DMD DLP MIT 2 71 2 710 Optics 11 30 05 wk13 b 19 Sandia Micro mirror display http www howstuffworks com MIT 2 71 2 710 Optics 11 30 05 wk13 b 20 Micromirrors for adaptive optics MIT 2 71 2 710 Optics 11 30 05 wk13 b 21 V ran J P Durand D 2000 ASP Conf Ser 216 345 2000 Grating Light Valve GLV display www meko co uk Silicon Light Machines www siliconlight com MIT 2 71 2 710 Optics 11 30 05 wk13 b 22 Binary Optics Refractive Diffractive prism blazed grating 1 1 sinc N 2 2 MIT 2 71 2 710 Optics 11 30 05 wk13 b 23 Binary efficiency of 1st diffracted order from step wise binary approximation to blazed grating with N steps over 2 range Binary Optics binary grating Amplitude mask t x X 1 x 0 MIT 2 71 2 710 Optics 11 30 05 wk13 b 24 Binary Optics binary grating Phase mask t x X 1 x 1 x X x 0 MIT 2 71 2 710 Optics 11 30 05 wk13 b 25 t x exp i x Fourier series for binary phase grating t x 1 X x 1 MIT 2 71 2 710 Optics 11 30 05 wk13 b 26 nx n sinc exp 2 i X 2 n n 0 Fourier series for binary phase grating t x 1 X x 1 nx n sinc exp 2 i X 2 n n 0 identify physical meaning plane waves orientation of nth plane wave sin n n X diffracted orders MIT 2 71 2 710 Optics 11 30 05 wk13 b 27 Fourier series for binary phase grating t x 1 X x 1 n nx n sinc exp 2 i X 2 n n 0 identify physical meaning plane waves orientation of nth plane wave sin n n X diffracted orders MIT 2 71 2 710 Optics 11 30 05 wk13 b 28 Fourier series for binary phase grating t x 1 X x 1 nx n sinc exp 2 i X 2 n n 0 n sinc odd orders only 2 n identify physical meaning plane waves orientation of nth plane wave sin n n X diffracted orders MIT 2 71 2 710 Optics 11 30 05 wk13 b 29 Fourier series for binary phase grating t x 1 X x nx n sinc exp 2 i X 2 n n 0 1 Fourier transform exp i 2 u0 x u u0 MIT 2 71 2 710 Optics 11 30 05 wk13 b 30 result is n n sinc u Fourier series X 2 n n 0 Diffracted spectrum from binary phase grating t x X 1 x nx n sinc exp 2 i X 2 n n 0 1 n sinc 2 T u 1 1 X u 0 n n sinc u X 2 n n 0 MIT 2 71 2 710 Optics 11 30 05 wk13 b 31 Fourier plane diffraction from finite binary phase grating f MIT 2 71 2 710 Optics 11 30 05 wk13 b 32 f x not to scale The Fresnel Zone Plate FZP r 2 1 amplitude FZP g x y 1 sgn cos 2 f phase FZP MIT 2 71 …